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2020 – today
- 2023
[c8]Jinfa Hong, Hei Wong
, Oliver C. S. Choy, Ray C. C. Cheung:
A Platform for Adaptive Interference Mitigation and Intent Analysis Using OpenLANE. ICSPCC 2023: 1-6- 2022
- [j57]Hei Wong, Shurong Dong, Zehua Chen:
Effects of non-fatal electrostatic discharge on the threshold voltage degradation in nano CMOS devices. Sci. China Inf. Sci. 65(2) (2022) - 2020
- [j56]Shuk-Fun Lai, Wing-Shan Tam, Chi-Wah Kok, Hei Wong:
CMOS low power split-drain MAGFET based magnetic field strength sensor. Microelectron. J. 100: 104759 (2020)
2010 – 2019
- 2018
- [j55]Tao Hu, Shurong Dong, Hao Jin, Hei Wong, Zekun Xu, Xiang Li, Juin J. Liou:
A double snapback SCR ESD protection scheme for 28 nm CMOS process. Microelectron. Reliab. 84: 20-25 (2018) - [j54]Xuan Feng, Nagarajan Raghavan, Sen Mei, Shurong Dong, Kin Leong Pey, Hei Wong:
Statistical nature of hard breakdown recovery in high-κ dielectric stacks studied using ramped voltage stress. Microelectron. Reliab. 88-90: 164-168 (2018) - [j53]Yao Liu, Xiao-Zhou Li, Ray C. C. Cheung, Sze-Chun Chan, Hei Wong:
High-Speed Discrete Gaussian Sampler With Heterodyne Chaotic Laser Inputs. IEEE Trans. Circuits Syst. II Express Briefs 65-II(6): 794-798 (2018) - [c7]Yao Liu, Ray C. C. Cheung, Hei Wong:
Lightweight Secure Processor Prototype on FPGA. FPL 2018: 443-444 - 2017
- [j52]Yao Liu, Ray C. C. Cheung, Hei Wong:
A Bias-Bounded Digital True Random Number Generator Architecture. IEEE Trans. Circuits Syst. I Regul. Pap. 64-I(1): 133-144 (2017) - 2016
- [j51]Asen Asenov, Ulf Schlichtmann, Cher Ming Tan, Hei Wong, Xing Zhou:
Editorial. Microelectron. Reliab. 61: 1-2 (2016) - [j50]Xuan Feng, Shurong Dong, Hei Wong, Danqun Yu, Kin Leong Pey, Kalya Shubhakar, W. S. Lau:
Effects of thermal annealing on the charge localization characteristics of HfO2/Au/HfO2 stack. Microelectron. Reliab. 61: 78-81 (2016) - [j49]Danqun Yu, W. S. Lau, Hei Wong, Xuan Feng, Shurong Dong, Kin Leong Pey:
The variation of the leakage current characteristics of W/Ta2O5/W MIM capacitors with the thickness of the bottom W electrode. Microelectron. Reliab. 61: 95-98 (2016) - [j48]Zhihui Yu, Hao Jin, Shurong Dong, Hei Wong, Jie Zeng, Weihuai Wang:
Comparative study of reliability degradation behaviors of LDMOS and LDMOS-SCR ESD protection devices. Microelectron. Reliab. 61: 111-114 (2016) - [j47]Lixia Sun, Jianxin Zhu, Hei Wong:
Simulation and evaluation of the peak temperature in LED light bulb heatsink. Microelectron. Reliab. 61: 140-144 (2016) - 2015
- [j46]Oi-Ying Wong, Hei Wong, Wing-Shan Tam, Chi-Wah Kok:
A dynamic-biasing 4× charge pump based on exponential topology. Int. J. Circuit Theory Appl. 43(3): 401-414 (2015) - [j45]Wing-Shan Tam, Chi-Wah Kok, Hei Wong:
Optimization of loss tangent and capacitor size of micro-vacuum dielectric capacitors. Microelectron. J. 46(12): 1382-1386 (2015) - [j44]Weiyin Wang, Hei Wong, Yan Han:
A high-efficiency full-wave CMOS rectifying charge pump for RF energy harvesting applications. Microelectron. J. 46(12): 1447-1452 (2015) - [c6]Zehua Chen, Weiyin Wang, Hei Wong:
Low-voltage CMOS DC-DC converters for energy harvesting applications. ASICON 2015: 1-4 - 2014
- [j43]Asen Asenov, Ulf Schlichtmann, Cher Ming Tan, Hei Wong, Xing Zhou:
Special section reliability and variability of devices for circuits and systems. Microelectron. Reliab. 54(6-7): 1057 (2014) - [j42]Zehua Chen, Hei Wong, Yan Han, Shurong Dong, B. L. Yang:
Temperature dependences of threshold voltage and drain-induced barrier lowering in 60 nm gate length MOS transistors. Microelectron. Reliab. 54(6-7): 1109-1114 (2014) - [j41]Wing-Shan Tam, Chi-Wah Kok, Sik-Lam Siu, Wing-Man Tang, Chi-Wah Leung, Hei Wong:
Thermal stability of sectorial split-drain magnetic field-effect transistors. Microelectron. Reliab. 54(6-7): 1115-1118 (2014) - [j40]Xuan Feng, Hei Wong, B. L. Yang, Shurong Dong, Hiroshi Iwai, Kuniyuki Kakushima:
On the current conduction mechanisms of CeO2/La2O3 stacked gate dielectric. Microelectron. Reliab. 54(6-7): 1133-1136 (2014) - [j39]Wing-Shan Tam, Chi-Wah Kok, Sik-Lam Siu, Hei Wong:
Snapback breakdown ESD device based on zener diodes on silicon-on-insulator technology. Microelectron. Reliab. 54(6-7): 1163-1168 (2014) - 2013
- [j38]Ekachai Leelarasmee, Hei Wong:
Editorial. J. Circuits Syst. Comput. 22(9) (2013) - [j37]Hei Wong, B. L. Yang, Shurong Dong:
Thermal and voltage instabilities of hafnium oxide films prepared by sputtering technique. Microelectron. Reliab. 53(12): 1863-1867 (2013) - 2012
- [j36]Hei Wong:
Advances in non-volatile memory technology. Microelectron. Reliab. 52(4): 611-612 (2012) - [j35]Oi-Ying Wong, Hei Wong, Wing-Shan Tam, Ted Chi-Wah Kok:
A comparative study of charge pumping circuits for flash memory applications. Microelectron. Reliab. 52(4): 670-687 (2012) - [j34]Asen Asenov, Ulf Schlichtmann, Cher Ming Tan, Hei Wong, Xing Zhou:
ICMAT 2011 - Reliability and variability of semiconductor devices and ICs. Microelectron. Reliab. 52(8): 1531 (2012) - [j33]S.-L. Siu, Wing-Shan Tam, Hei Wong, Chi-Wah Kok, K. Kakusima, Hiroshi Iwai:
Influence of multi-finger layout on the subthreshold behavior of nanometer MOS transistors. Microelectron. Reliab. 52(8): 1606-1609 (2012) - [j32]B. L. Yang, Hei Wong, Kuniyuki Kakushima, Hiroshi Iwai:
Improving the electrical characteristics of MOS transistors with CeO2/La2O3 stacked gate dielectric. Microelectron. Reliab. 52(8): 1613-1616 (2012) - [j31]J. Liu, Hei Wong, Sik-Lam Siu, Chi-Wah Kok, Valeriu Filip:
Degradation behaviors of GaN light-emitting diodes under high-temperature and high-current stressing. Microelectron. Reliab. 52(8): 1636-1639 (2012) - [j30]Wing-Shan Tam, Sik-Lam Siu, Oi-Ying Wong, Chi-Wah Kok, Hei Wong, Valeriu Filip:
Modeling of terminal ring structures for high-voltage power MOSFETs. Microelectron. Reliab. 52(8): 1645-1650 (2012) - 2011
- [j29]Wing-Shan Tam, Sik-Lam Siu, Bing-Liang Yang, Chi-Wah Kok, Hei Wong:
Off-state drain breakdown mechanisms of VDMOS with anti-JFET implantation. Microelectron. Reliab. 51(12): 2064-2068 (2011) - [c5]Oi-Ying Wong, Hei Wong, Wing-Shan Tam, Chi-Wah Kok:
An overview of charge pumping circuits for flash memory applications. ASICON 2011: 116-119 - 2010
- [j28]Wing-Shan Tam, Oi-Ying Wong, Ka-Yan Mok, Chi-Wah Kok, Hei Wong:
An Energy Efficient Half-Static Clock-Gating d-Type flip-Flop. J. Circuits Syst. Comput. 19(3): 635-654 (2010) - [j27]Yu. N. Novikov, A. V. Vishnyakov, V. A. Gritsenko, K. A. Nasyrov, Hei Wong:
Modeling the charge transport mechanism in amorphous Al2O3 with multiphonon trap ionization effect. Microelectron. Reliab. 50(2): 207-210 (2010) - [j26]Wing-Shan Tam, Oi-Ying Wong, Tsz-Ching Ng, Chi-Wah Kok, Hei Wong:
Analysis of ESD discharge current distribution and area optimization of VDMOS gate protection structure. Microelectron. Reliab. 50(5): 622-626 (2010) - [j25]Oi-Ying Wong, Wing-Shan Tam, Jun Liu, Oi-Kan Shea, Shiu Hung Cheung, Chi-Wah Kok, Hei Wong:
Modeling of high-frequency characteristics for epoxy-sealed micro vacuum capacitors. Microelectron. Reliab. 50(5): 627-630 (2010) - [j24]Wing-Shan Tam, Oi-Ying Wong, Chi-Wah Kok, Hei Wong:
Generating sub-1V reference voltages from a resistorless CMOS bandgap reference circuit by using a piecewise curvature temperature compensation technique. Microelectron. Reliab. 50(8): 1054-1061 (2010)
2000 – 2009
- 2009
- [j23]Hei Wong, Y. Fu, Juin J. Liou, Y. Yue:
Hot-carrier reliability and breakdown characteristics of multi-finger RF MOS transistors. Microelectron. Reliab. 49(1): 13-16 (2009) - [j22]Jun Liu, Wing-Shan Tam, Hei Wong, Valeriu Filip:
Temperature-dependent light-emitting characteristics of InGaN/GaN diodes. Microelectron. Reliab. 49(1): 38-41 (2009) - [j21]Sik-Lam Siu, Hei Wong, Wing-Shan Tam, Kuniyuki Kakushima, Hiroshi Iwai:
Subthreshold parameters of radio-frequency multi-finger nanometer MOS transistors. Microelectron. Reliab. 49(4): 387-391 (2009) - [j20]Oi-Ying Wong, Wing-Shan Tam, Oi-Kan Shea, Shiu Hung Cheung, Jun Liu, Chi-Wah Kok, Hei Wong:
Effects of periphery encapsulation material on the characteristics of micro vacuum dielectric capacitor. Microelectron. Reliab. 49(5): 506-509 (2009) - [c4]Oi-Ying Wong, Wing-Shan Tam, Chi-Wah Kok, Hei Wong:
Area Efficient 2n× Switched Capacitor Charge Pump. ISCAS 2009: 820-823 - 2008
- [j19]C. K. Wong, Hei Wong, Mansun Chan, Y. T. Chow, H. P. Chan:
Silicon oxynitride integrated waveguide for on-chip optical interconnects applications. Microelectron. Reliab. 48(2): 212-218 (2008) - [j18]Banani Sen, Bing-Liang Yang, Hei Wong, Chi-Wah Kok, P. K. Chu, A. Huang:
Effects of aluminum incorporation on hafnium oxide film using plasma immersion ion implantation. Microelectron. Reliab. 48(11-12): 1765-1768 (2008) - [c3]Oi-Ying Wong, Wing-Shan Tam, Chi-Wah Kok, Hei Wong:
Current mode track and hold circuit with 50MS/sec speed and 8-bit resolution. APCCAS 2008: 1168-1171 - [c2]Oi-Ying Wong, Wing-Shan Tam, Chi-Wah Kok, Hei Wong:
Design strategy for 2-phase switched capacitor charge pump. APCCAS 2008: 1328-1331 - [c1]Wing-Shan Tam, Oi-Ying Wong, Chi-Wah Kok, Hei Wong, Albert Z. H. Wang:
A Wideband three-stage rail-to-rail power amplifier driving large capacitive load. APCCAS 2008: 1394-1397 - 2007
- [j17]Hei Wong, Valeriu Filip, C. K. Wong, P. S. Chung:
Silicon integrated photonics begins to revolutionize. Microelectron. Reliab. 47(1): 1-10 (2007) - [j16]Sergey Shaimeev, Vladimir Gritsenko, Kaupo Kukli, Hei Wong, Eun-Hong Lee, Chungwoo Kim:
Single band electronic conduction in hafnium oxide prepared by atomic layer deposition. Microelectron. Reliab. 47(1): 36-40 (2007) - [j15]Y. Fu, Hei Wong, Juin J. Liou:
Characterization and modeling of flicker noise in junction field-effect transistor with source and drain trench isolation. Microelectron. Reliab. 47(1): 46-50 (2007) - 2006
- [j14]Valeriu Filip, Hei Wong, D. Nicolaescu:
Definition of curve fitting parameter to study tunneling and trapping of electrons in Si/ultra-thin SiO2/metal structures. Microelectron. Reliab. 46(7): 1027-1034 (2006) - [j13]C. K. Wong, Hei Wong, Mansun Chan, Chi-Wah Kok, H. P. Chan:
Minimizing hydrogen content in silicon oxynitride by thermal oxidation of silicon-rich silicon nitride. Microelectron. Reliab. 46(12): 2056-2061 (2006) - 2005
- [j12]Nian Zhan, M. C. Poon, Hei Wong, K. L. Ng, Chi-Wah Kok:
Dielectric breakdown characteristics and interface trapping of hafnium oxide films. Microelectron. J. 36(1): 29-33 (2005) - 2004
- [j11]Bing-Liang Yang, P. T. Lai, Hei Wong:
Conduction mechanisms in MOS gate dielectric films. Microelectron. Reliab. 44(5): 709-718 (2004) - 2003
- [j10]Hei Wong:
Low-frequency noise study in electron devices: review and update. Microelectron. Reliab. 43(4): 585-599 (2003) - [j9]Jackie Chan, Hei Wong, M. C. Poon, Chi-Wah Kok:
Oxynitride gate dielectric prepared by thermal oxidation of low-pressure chemical vapor deposition silicon-rich silicon nitride. Microelectron. Reliab. 43(4): 611-616 (2003) - [j8]V. A. Gritsenko, A. V. Shaposhnikov, Yu. N. Novikov, A. P. Baraban, Hei Wong, G. M. Zhidomirov, M. Roger:
Onefold coordinated oxygen atom: an electron trap in the silicon oxide. Microelectron. Reliab. 43(4): 665-669 (2003) - [j7]K. L. Ng, Nian Zhan, Chi-Wah Kok, M. C. Poon, Hei Wong:
Electrical characterization of the hafnium oxide prepared by direct sputtering of Hf in oxygen with rapid thermal annealing. Microelectron. Reliab. 43(8): 1289-1293 (2003) - 2002
- [j6]Hei Wong:
Recent developments in silicon optoelectronic devices. Microelectron. Reliab. 42(3): 317-326 (2002) - [j5]Hei Wong, V. A. Gritsenko:
Defects in silicon oxynitride gate dielectric films. Microelectron. Reliab. 42(4-5): 597-605 (2002) - [j4]P. G. Han, Hei Wong, Andy H. P. Chan, M. C. Poon:
A novel approach for fabricating light-emitting porous polysilicon films. Microelectron. Reliab. 42(6): 929-933 (2002) - [j3]Bing-Liang Yang, N. W. Cheung, S. Denholm, J. Shao, Hei Wong, P. T. Lai, Y. C. Cheng:
Ultra-shallow n+p junction formed by PH3 and AsH3 plasma immersion ion implantation. Microelectron. Reliab. 42(12): 1985-1989 (2002) - 2001
- [j2]Hei Wong, P. G. Han, M. C. Poon, Y. Gao:
Investigation of the surface silica layer on porous poly-Si thin films. Microelectron. Reliab. 41(2): 179-184 (2001) - [j1]M. C. Poon, Y. Gao, Ted Chi-Wah Kok, A. M. Myasnikov, Hei Wong:
SIMS study of silicon oxynitride prepared by oxidation of silicon-rich silicon nitride layer. Microelectron. Reliab. 41(12): 2071-2074 (2001)
Coauthor Index
aka: Ted Chi-Wah Kok
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