"Ultra-shallow n+p junction formed by PH3 and ..."

Bing-Liang Yang et al. (2002)

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DOI: 10.1016/S0026-2714(02)00099-9

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type: Journal Article

metadata version: 2020-02-22

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Bing-Liang Yang, N. W. Cheung, S. Denholm, J. Shao, Hei Wong, P. T. Lai, Y. C. Cheng:
Ultra-shallow n⁺p junction formed by PH₃ and AsH₃ plasma immersion ion implantation. Microelectron. Reliab. 42(12): 1985-1989 (2002)

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