"Minimizing hydrogen content in silicon oxynitride by thermal oxidation of ..."

C. K. Wong et al. (2006)

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DOI: 10.1016/J.MICROREL.2006.01.006

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type: Journal Article

metadata version: 2020-02-22

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C. K. Wong, Hei Wong, Mansun Chan, Chi-Wah Kok, H. P. Chan:
Minimizing hydrogen content in silicon oxynitride by thermal oxidation of silicon-rich silicon nitride. Microelectron. Reliab. 46(12): 2056-2061 (2006)

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