"Effects of thermal annealing on the charge localization characteristics of ..."

Xuan Feng et al. (2016)

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DOI: 10.1016/J.MICROREL.2016.02.012

access: closed

type: Journal Article

metadata version: 2022-10-02

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Xuan Feng, Shurong Dong, Hei Wong, Danqun Yu, Kin Leong Pey, Kalya Shubhakar, W. S. Lau:
Effects of thermal annealing on the charge localization characteristics of HfO₂/Au/HfO₂ stack. Microelectron. Reliab. 61: 78-81 (2016)

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