"The variation of the leakage current characteristics of ..."

Danqun Yu et al. (2016)

> Home

Details and statistics

DOI: 10.1016/J.MICROREL.2016.02.013

access: closed

type: Journal Article

metadata version: 2022-10-02

- view
  - electronic edition via DOI
  - unpaywalled version
  authority control:
- export record
  dblp key:
  - journals/mr/YuLWFDP16
- ask others
- share record
  persistent URL:
  - https://dblp.org/rec/journals/mr/YuLWFDP16
Danqun Yu, W. S. Lau, Hei Wong, Xuan Feng, Shurong Dong, Kin Leong Pey:
The variation of the leakage current characteristics of W/Ta₂O₅/W MIM capacitors with the thickness of the bottom W electrode. Microelectron. Reliab. 61: 95-98 (2016)

manage site settings

To protect your privacy, all features that rely on external API calls from your browser are turned off by default. You need to opt-in for them to become active. All settings here will be stored as cookies with your web browser. For more information see our F.A.Q.