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2020 – today
- 2020
[c8]Wei Ye, Mohamed Baker Alawieh, Yuki Watanabe, Shigeki Nojima, Yibo Lin, David Z. Pan:
TEMPO: Fast Mask Topography Effect Modeling with Deep Learning. ISPD 2020: 127-134
2010 – 2019
- 2019
- [j3]Yibo Lin
, Meng Li, Yuki Watanabe, Taiki Kimura, Tetsuaki Matsunawa, Shigeki Nojima, David Z. Pan:
Data Efficient Lithography Modeling With Transfer Learning and Active Data Selection. IEEE Trans. Comput. Aided Des. Integr. Circuits Syst. 38(10): 1900-1913 (2019) - 2018
- [j2]Xiaoqing Xu, Yibo Lin, Meng Li, Tetsuaki Matsunawa, Shigeki Nojima, Chikaaki Kodama, Toshiya Kotani, David Z. Pan:
Subresolution Assist Feature Generation With Supervised Data Learning. IEEE Trans. Comput. Aided Des. Integr. Circuits Syst. 37(6): 1225-1236 (2018) - [c7]Yibo Lin, Yuki Watanabe, Taiki Kimura, Tetsuaki Matsunawa, Shigeki Nojima, Meng Li, David Z. Pan:
Data Efficient Lithography Modeling with Residual Neural Networks and Transfer Learning. ISPD 2018: 82-89 - [i1]Yibo Lin, Meng Li, Yuki Watanabe, Taiki Kimura, Tetsuaki Matsunawa, Shigeki Nojima, David Z. Pan:
Data Efficient Lithography Modeling with Transfer Learning and Active Data Selection. CoRR abs/1807.03257 (2018) - 2017
- [c6]Yoichi Tomioka, Tetsuaki Matsunawa, Chikaaki Kodama, Shigeki Nojima:
Lithography hotspot detection by two-stage cascade classifier using histogram of oriented light propagation. ASP-DAC 2017: 81-86 - 2016
- [c5]Yukihide Kohira, Atsushi Takahashi, Tomomi Matsui, Chikaaki Kodama, Shigeki Nojima, Satoshi Tanaka:
Manufacturability-aware mask assignment in multiple patterning lithography. APCCAS 2016: 538-541 - [c4]Xiaoqing Xu, Tetsuaki Matsunawa, Shigeki Nojima, Chikaaki Kodama, Toshiya Kotani, David Z. Pan:
A Machine Learning Based Framework for Sub-Resolution Assist Feature Generation. ISPD 2016: 161-168 - 2015
- [j1]Chikaaki Kodama, Hirotaka Ichikawa, Koichi Nakayama, Fumiharu Nakajima, Shigeki Nojima, Toshiya Kotani, Takeshi Ihara, Atsushi Takahashi:
Self-Aligned Double and Quadruple Patterning Aware Grid Routing Methods. IEEE Trans. Comput. Aided Des. Integr. Circuits Syst. 34(5): 753-765 (2015) - [c3]Yukihide Kohira, Tomomi Matsui, Yoko Yokoyama, Chikaaki Kodama, Atsushi Takahashi, Shigeki Nojima, Satoshi Tanaka:
Fast mask assignment using positive semidefinite relaxation in LELECUT triple patterning lithography. ASP-DAC 2015: 665-670 - 2013
- [c2]Chikaaki Kodama, Hirotaka Ichikawa, Koichi Nakayama, Toshiya Kotani, Shigeki Nojima, Shoji Mimotogi, Shinji Miyamoto, Atsushi Takahashi:
Self-Aligned Double and Quadruple Patterning-aware grid routing with hotspots control. ASP-DAC 2013: 267-272 - [c1]Shigeki Nojima:
Optical lithography extension with double patterning. ISPD 2013: 68
Coauthor Index
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