"TEMPO: Fast Mask Topography Effect Modeling with Deep Learning."

Wei Ye et al. (2020)

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DOI: 10.1145/3372780.3375565

access: closed

type: Conference or Workshop Paper

metadata version: 2020-12-28

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  dblp key:
  - conf/ispd/YeAWNLP20
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  - https://dblp.org/rec/conf/ispd/YeAWNLP20
Wei Ye, Mohamed Baker Alawieh, Yuki Watanabe, Shigeki Nojima, Yibo Lin, David Z. Pan:
TEMPO: Fast Mask Topography Effect Modeling with Deep Learning. ISPD 2020: 127-134

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