"Fast mask assignment using positive semidefinite relaxation in LELECUT ..."

Yukihide Kohira et al. (2015)

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DOI: 10.1109/ASPDAC.2015.7059084

access: closed

type: Conference or Workshop Paper

metadata version: 2023-05-01

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Yukihide Kohira, Tomomi Matsui, Yoko Yokoyama, Chikaaki Kodama, Atsushi Takahashi, Shigeki Nojima, Satoshi Tanaka:
Fast mask assignment using positive semidefinite relaxation in LELECUT triple patterning lithography. ASP-DAC 2015: 665-670

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