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ORCIDGuenther Benstetter
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2010 – 2019
- 2017
[j13]Tobias Berthold
, Guenther Benstetter, Werner Frammelsberger, Manuel Bogner, Rosana Rodríguez, Montserrat Nafría:
Protective nanometer films for reliable Cu-Cu connections. Microelectron. Reliab. 76-77: 383-389 (2017)- 2013
- [j12]Alexander Hofer, Roland Biberger, Günther Benstetter, Björn Wilke, Holger Göbel:
Scanning probe microscopy based electrical characterization of thin dielectric and organic semiconductor films. Microelectron. Reliab. 53(9-11): 1430-1433 (2013) - 2010
- [j11]Roland Biberger, Guenther Benstetter, Holger Goebel, Alexander Hofer:
Intermittent-contact capacitance spectroscopy - A new method for determining C(V) curves with sub-micron lateral resolution. Microelectron. Reliab. 50(9-11): 1511-1513 (2010)
2000 – 2009
- 2009
- [j10]Roland Biberger, Guenther Benstetter, Holger Goebel:
Displacement current sensor for contact and intermittent contact scanning capacitance microscopy. Microelectron. Reliab. 49(9-11): 1192-1195 (2009) - 2008
- [j9]Roland Biberger, Guenther Benstetter, Thomas Schweinböck, Peter Breitschopf, Holger Goebel:
Intermittent-contact scanning capacitance microscopy versus contact mode SCM applied to 2D dopant profiling. Microelectron. Reliab. 48(8-9): 1339-1342 (2008) - 2007
- [j8]Mario Lanza, Marc Porti, Montserrat Nafría, Guenther Benstetter, Werner Frammelsberger, Heiko Ranzinger, E. Lodermeier, G. Jaschke:
Influence of the manufacturing process on the electrical properties of thin (k stacks observed with CAFM. Microelectron. Reliab. 47(9-11): 1424-1428 (2007) - 2006
- [j7]Werner Bergbauer, Thomas Lutz, Werner Frammelsberger, Guenther Benstetter:
Kelvin probe force microscopy - An appropriate tool for the electrical characterisation of LED heterostructures. Microelectron. Reliab. 46(9-11): 1736-1740 (2006) - 2005
- [j6]Peter Breitschopf, Guenther Benstetter, Bernhard Knoll, Werner Frammelsberger:
Intermittent contact scanning capacitance microscopy-An improved method for 2D doping profiling. Microelectron. Reliab. 45(9-11): 1568-1571 (2005) - 2004
- [j5]Thomas Schweinböck, S. Schömann, D. Álvarez, Marco Buzzo, Werner Frammelsberger, Peter Breitschopf, Günther Benstetter:
New trends in the application of Scanning Probe Techniques in Failure Analysis. Microelectron. Reliab. 44(9-11): 1541-1546 (2004) - [j4]Günther Benstetter, Peter Breitschopf, Werner Frammelsberger, Heiko Ranzinger, Peter Reislhuber, Thomas Schweinböck:
AFM-based scanning capacitance techniques for deep sub-micron semiconductor failure analysis. Microelectron. Reliab. 44(9-11): 1615-1619 (2004) - 2003
- [j3]Michael W. Ruprecht, Guenther Benstetter, Douglas B. Hunt:
A review of ULSI failure analysis techniques for DRAMs. Part II: Defect isolation and visualization. Microelectron. Reliab. 43(1): 17-41 (2003) - [j2]Werner Frammelsberger, Guenther Benstetter, Thomas Schweinböck, Richard J. Stamp, Janice Kiely:
Characterization of thin and ultra-thin SiO2 films and SiO2/Si interfaces with combined conducting and topographic atomic force microscopy. Microelectron. Reliab. 43(9-11): 1465-1470 (2003) - 2002
- [j1]Guenther Benstetter, Michael W. Ruprecht, Douglas B. Hunt:
A review of ULSI failure analysis techniques for DRAMs 1. Defect localization and verification. Microelectron. Reliab. 42(3): 307-316 (2002)
Coauthor Index
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