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Journal Articles
- 2017
[j9]Hua-Chiang Wen, Wu-Ching Chou, Po-Chen Lin, Yeau-Ren Jeng
, Chien-Chang Chen, Hung-Ming Chen, Don Son Jiang, Chun-Hu Cheng:
Using nanoindentation to investigate the temperature cycling of Sn-37Pb solders. Microelectron. Reliab. 78: 111-117 (2017)- [j8]Hua-Chiang Wen, Wu-Ching Chou, Shiuan Huei Lin, Don Son Jiang:
Nanomechanical properties of Ag solder bumps doped with Pd and Au. Microelectron. Reliab. 79: 270-275 (2017) - 2014
- [j7]Wun-Kai Wang, Hua-Chiang Wen, Chun-Hu Cheng, Ching-Hua Hung, Wu-Ching Chou, Wei-Hung Yau, Ping-Feng Yang, Yi-Shao Lai:
Nanotribological properties of ALD-processed bilayer TiO2/ZnO films. Microelectron. Reliab. 54(12): 2754-2759 (2014) - 2011
- [j6]Wei-Hung Yau, Pai-Chung Tseng, Hua-Chiang Wen, Chien-Huang Tsai, Wu-Ching Chou:
Luminescence properties of mechanically nanoindented ZnSe. Microelectron. Reliab. 51(5): 931-935 (2011) - [j5]Ming-Jhang Wu, Hua-Chiang Wen, Shyh-Chi Wu, Ping-Feng Yang, Yi-Shao Lai, Wen-Kuang Hsu, Wen-Fa Wu, Chang-Pin Chou:
Evaluating nanotribological behavior of annealing Si0.8Ge0.2/Si films. Microelectron. Reliab. 51(12): 2223-2227 (2011) - 2010
- [j4]Bo-Ching He, Chun-Hu Cheng, Hua-Chiang Wen, Yi-Shao Lai, Ping-Feng Yang, Meng-Hung Lin, Wen-Fa Wu, Chang-Pin Chou:
Evaluation of the nanoindentation behaviors of SiGe epitaxial layer on Si substrate. Microelectron. Reliab. 50(1): 63-69 (2010) - [j3]Bo-Ching He, Hua-Chiang Wen, Meng-Hung Lin, Yi-Shao Lai, Wen-Fa Wu, Chang-Pin Chou:
Effect of annealing treatment and nanomechanical properties for multilayer Si0.8Ge0.2-Si films. Microelectron. Reliab. 50(6): 851-856 (2010) - [j2]Yu-Ming Chang, Hua-Chiang Wen, Chu-Shou Yang, Derming Lian, Chien-Huang Tsai, Jyh-Shyang Wang, Wen-Fa Wu, Chang-Pin Chou:
Evaluating the abrasive wear of Zn1-xMnxO heteroepitaxial layers using a nanoscratch technique. Microelectron. Reliab. 50(8): 1111-1115 (2010) - 2008
- [j1]Ping-Feng Yang, Hua-Chiang Wen, Sheng-Rui Jian, Yi-Shao Lai, Sean Wu, Rong-Sheng Chen:
Characteristics of ZnO thin films prepared by radio frequency magnetron sputtering. Microelectron. Reliab. 48(3): 389-394 (2008)
Coauthor Index
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