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ORCIDYasushi Nakasaki
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2020 – today
- 2023
[c4]Harumi Seki, Reika Ichihara, Yusuke Higashi, Yasushi Nakasaki, Masumi Saitoh, Masamichi Suzuki:
Comprehensive Analysis of Hole-Trapping in SiN Films with a Wide Range of Time Constants Based on Dynamic C-V. IRPS 2023: 1-7- 2020
- [c3]Harumi Seki, Yasushi Nakasaki, Yuichiro Mitani:
Further Investigation on Mechanism of Trap Level Modulation in Silicon Nitride Films by Fluorine Incorporation. IRPS 2020: 1-7
2010 – 2019
- 2018
- [c2]Yuichiro Mitani, Yusuke Higashi
, Yasushi Nakasaki:
Study on mechanism of thermal curing in ultra-thin gate dielectrics. IRPS 2018: 3 - [c1]Marina Yamaguchi, Shosuke Fujii, Yuuichi Kamimuta, Shoichi Kabuyanagi, Tsunehiro Ino, Yasushi Nakasaki, Riichiro Takaishi, Reika Ichihara, Masumi Saitoh:
Impact of specific failure mechanisms on endurance improvement for HfO2-based ferroelectric tunnel junction memory. IRPS 2018: 6 - 2017
- [j2]Yusuke Higashi, Riichiro Takaishi, Koichi Kato, Masamichi Suzuki, Yasushi Nakasaki, Mitsuhiro Tomita, Yuichiro Mitani, Masuaki Matsumoto, Shohei Ogura, Katsuyuki Fukutani, Kikuo Yamabe:
Mechanism of gate dielectric degradation by hydrogen migration from the cathode interface. Microelectron. Reliab. 70: 12-21 (2017) - 2013
- [j1]Izumi Hirano, Yasushi Nakasaki, Shigeto Fukatsu, Masakazu Goto, Koji Nagatomo, Seiji Inumiya, Katsuyuki Sekine, Yuichiro Mitani, Kikuo Yamabe:
Time-dependent dielectric breakdown (TDDB) distribution in n-MOSFET with HfSiON gate dielectrics under DC and AC stressing. Microelectron. Reliab. 53(12): 1868-1874 (2013)
Coauthor Index
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