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ORCIDShayak Banerjee
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2020 – today
- 2022
[c13]Shayak Banerjee, Vijay Pappu, Nilothpal Talukder, Shoya Yoshida, Arnab Bhadury, Allison Schloss, Jasmine Paulino:
Timely Personalization at Peloton: A System and Algorithm for Boosting Time-Relevant Content. RecSys 2022: 494-498- 2021
- [c12]Shayak Banerjee, Arnab Bhadury, Nilothpal Talukder, Santosh Thammana:
Personalizing Peloton: Combining Rankers and Filters To Balance Engagement and Business Goals. RecSys 2021: 575-576
2010 – 2019
- 2016
- [j1]Yu-Hsuan Su, Yu-Chen Huang, Liang-Chun Tsai, Yao-Wen Chang
, Shayak Banerjee:
Fast Lithographic Mask Optimization Considering Process Variation. IEEE Trans. Comput. Aided Des. Integr. Circuits Syst. 35(8): 1345-1357 (2016) - 2014
- [c11]Yu-Hsuan Su, Yu-Chen Huang, Liang-Chun Tsai, Yao-Wen Chang, Shayak Banerjee:
Fast lithographic mask optimization considering process variation. ICCAD 2014: 230-237 - 2013
- [c10]Shayak Banerjee, Zhuo Li, Sani R. Nassif:
ICCAD-2013 CAD contest in mask optimization and benchmark suite. ICCAD 2013: 271-274 - [c9]Sani R. Nassif, Gi-Joon Nam, Shayak Banerjee:
Wire delay variability in nanoscale technology and its impact on physical design. ISQED 2013: 591-596 - 2012
- [c8]Kanak B. Agarwal, Shayak Banerjee:
Design driven patterning optimizations for low K1 lithography. ICICDT 2012: 1-4 - [c7]Shayak Banerjee, Kanak B. Agarwal, Sani R. Nassif:
Design-aware lithography. ISPD 2012: 3-8 - 2011
- [c6]Shayak Banerjee, Kanak B. Agarwal, Sani R. Nassif:
Electrically-driven retargeting for nanoscale layouts. CICC 2011: 1-4 - [c5]Shayak Banerjee, Kanak B. Agarwal, Sani R. Nassif, James A. Culp, Lars Liebmann, Michael Orshansky:
Coupling timing objectives with optical proximity correction for improved timing yield. ISQED 2011: 97-102 - 2010
- [c4]Shayak Banerjee, Kanak B. Agarwal, Michael Orshansky:
Ground rule slack aware tolerance-driven optical proximity correction for local metal interconnects. CICC 2010: 1-4 - [c3]Shayak Banerjee, Kanak B. Agarwal, Chin Ngai Sze, Sani R. Nassif, Michael Orshansky:
A methodology for propagating design tolerances to shape tolerances for use in manufacturing. DATE 2010: 1273-1278 - [c2]Shayak Banerjee, Kanak B. Agarwal, Michael Orshansky:
SMATO: Simultaneous mask and target optimization for improving lithographic process window. ICCAD 2010: 100-106
2000 – 2009
- 2008
- [c1]Shayak Banerjee, Praveen Elakkumanan, Lars Liebmann, Michael Orshansky:
Electrically driven optical proximity correction based on linear programming. ICCAD 2008: 473-479
Coauthor Index
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