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W. Skorupa

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Journal Articles

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2009
[j2]
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  dblp key:
  - journals/mj/ZhuLBAS09
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  persistent URL:
  - https://dblp.org/rec/journals/mj/ZhuLBAS09
C. Y. Zhu, C. C. Ling, G. Brauer, W. Anwand, W. Skorupa:
Deep-level defects study of arsenic-implanted ZnO single crystal. Microelectron. J. 40(2): 286-288 (2009)
2002
[j1]
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  - journals/mr/NazarovOLGRS02
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A. N. Nazarov, I. N. Osiyuk, V. S. Lysenko, T. Gebel, Lars Rebohle, W. Skorupa:
Charge trapping and degradation in Ge⁺ ion implanted SiO₂ layers during high-field electron injection. Microelectron. Reliab. 42(9-11): 1461-1464 (2002)

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