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2020 – today
- 2024
[j1]Ryuichi Nakajima
, Takafumi Ito, Shotaro Sugitani, Tomoya Kii, Mitsunori Ebara, Jun Furuta, Kazutoshi Kobayashi, Mathieu Louvat, Francois Jacquet, Jean-Christophe Eloy, Olivier Montfort, Lionel Jure, Vincent Huard:
Soft-Error Tolerance by Guard-Gate Structures on Flip-Flops in 22 and 65 nm FD-SOI Technologies. IEICE Trans. Electron. 107(7): 191-200 (2024)- 2023
- [c4]Shotaro Sugitani, Ryuichi Nakajima, Takafumi Ito, Jun Furuta, Kazutoshi Kobayashi, Mathieu Louvat, Francois Jacquet, Jean-Christophe Eloy, Olivier Montfort, Lionel Jure, Vincent Huard:
Radiation Hardness Evaluations of a Stacked Flip Flop in a 22 nm FD-SOI Process by Heavy-Ion Irradiation. IOLTS 2023: 1-5 - [c3]Francesco Conti, Davide Rossi, Gianna Paulin, Angelo Garofalo, Alfio Di Mauro, Georg Rutishauser, Gianmarco Ottavi, Manuel Eggimann, Hayate Okuhara, Vincent Huard, Olivier Montfort, Lionel Jure, Nils Exibard, Pascal Gouedo, Mathieu Louvat, Emmanuel Botte, Luca Benini:
A 12.4TOPS/W @ 136GOPS AI-IoT System-on-Chip with 16 RISC-V, 2-to-8b Precision-Scalable DNN Acceleration and 30%-Boost Adaptive Body Biasing. ISSCC 2023: 326-327 - 2022
- [c2]Vincent Huard, Francois Jacquet, Souhir Mhira, Lionel Jure, Olivier Montfort, Mathieu Louvat, L. Zaia, F. Bertrand, E. Acacia, O. Caffin, H. Belhadj, O. Durand, Nils Exibard, Vincent Bonnet, A. Charvier, Paolo Bernardi, Riccardo Cantoro:
Runtime Test Solution for Adaptive Aging Compensation and Fail Operational Safety mode. IRPS 2022: 8 - 2021
- [c1]Yasser Moursy, Thiago Raupp da Rosa, Lionel Jure, Anthony Quelen, Sébastien Genevey, Lionel Pierrefeu, Emmanuel G. Collins Jr., Joerg Winkler, Jonathan Park, Gaël Pillonnet, Vincent Huard, Andrea Bonzo, Philippe Flatresse:
A 0.021mm2 PVT-Aware Digital-Flow-Compatible Adaptive Back-Biasing Regulator with Scalable Drivers Achieving 450% Frequency Boosting and 30% Power Reduction in 22nm FDSOI Technology. ISSCC 2021: 492-494
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