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ORCIDSteven J. Holmes
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Journal Articles
- 1997
[j5]Steven J. Holmes, Peter H. Mitchell, Mark C. Hakey:
Manufacturing with DUV lithography. IBM J. Res. Dev. 41(1&2): 7-20 (1997)- [j4]Jane M. Shaw, Jeffrey D. Gelorme, Nancy C. LaBianca, Will E. Conley, Steven J. Holmes:
Negative photoresists for optical lithography. IBM J. Res. Dev. 41(1&2): 81-94 (1997) - 1995
- [j3]Eric Adler, John K. DeBrosse, Stephen F. Geissler, Steven J. Holmes, Mark D. Jaffe, Jeffrey B. Johnson, Charles W. Koburger III, Jerome B. Lasky, Brian Lloyd, Glen L. Miles, James S. Nakos, Wendell P. Noble Jr., Steven H. Voldman, Michael Armacost, Richard Ferguson:
The evolution of IBM CMOS DRAM technology. IBM J. Res. Dev. 39(1-2): 167-188 (1995) - [j2]Donald G. Chesebro, James W. Adkisson, Lyman R. Clark, Steven N. Eslinger, Margaret A. Faucher, Steven J. Holmes, Raymond P. Mallette, Edward J. Nowak, Edward W. Sengle, Steven H. Voldman, Thomas W. Weeks:
Overview of gate linewidth control in the manufacture of CMOS logic chips. IBM J. Res. Dev. 39(1-2): 189-200 (1995) - [j1]Charles W. Koburger III, William F. Clark, James W. Adkisson, Eric Adler, Paul E. Bakeman, Albert S. Bergendahl, Alan B. Botula, W. Chang, Bijan Davari, John H. Givens, Howard H. Hansen, Steven J. Holmes, David V. Horak, Chung Hon Lam, Jerome B. Lasky, Stephen E. Luce, Randy W. Mann, Glen L. Miles, James S. Nakos, Edward J. Nowak, Ghavam G. Shahidi, Yuan Taur, Francis R. White, Matthew R. Wordeman:
A half-micron CMOS logic generation. IBM J. Res. Dev. 39(1-2): 215-228 (1995)
Coauthor Index
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