"Negative photoresists for optical lithography."

Jane M. Shaw et al. (1997)

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DOI: 10.1147/RD.411.0081

access: closed

type: Journal Article

metadata version: 2020-03-13

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  - https://dblp.org/rec/journals/ibmrd/ShawGLCH97
Jane M. Shaw, Jeffrey D. Gelorme, Nancy C. LaBianca, Will E. Conley, Steven J. Holmes:
Negative photoresists for optical lithography. IBM J. Res. Dev. 41(1&2): 81-94 (1997)

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