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"Design optimization of gate-silicided ESD NMOSFETs in a 45 nm bulk CMOS ..."
David Alvarez et al. (2009)
- David Alvarez, Kiran V. Chatty, Christian Russ, Michel J. Abou-Khalil, Junjun Li, Robert Gauthier, Kai Esmark, Ralph Halbach, Christopher Seguin:
Design optimization of gate-silicided ESD NMOSFETs in a 45 nm bulk CMOS technology. Microelectron. Reliab. 49(12): 1417-1423 (2009)
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