"I/O thick oxide device integration using Diffusion and Gate Replacement ..."

Romain Ritzenthaler et al. (2015)

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DOI: 10.1109/ICICDT.2015.7165908

access: closed

type: Conference or Workshop Paper

metadata version: 2021-05-20

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Romain Ritzenthaler, Tom Schram, M. J. Cho, Anda Mocuta, Naoto Horiguchi, Aaron Voon-Yew Thean, Alessio Spessot, Christian Caillat, Marc Aoulaiche, Pierre Fazan, K. B. Noh, Y. Son:
I/O thick oxide device integration using Diffusion and Gate Replacement (D&GR) gate stack integration. ICICDT 2015: 1-4

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