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R. Weiland

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2000 – 2009

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2005
[j2]
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  - journals/mr/MuehleLWL05
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  - https://dblp.org/rec/journals/mr/MuehleLWL05
U. Muehle, A. Lenk, R. Weiland, H. Lichte:
Characterisation of dopants distribution using electron holography and FIB-based lift-off preparation. Microelectron. Reliab. 45(9-11): 1558-1561 (2005)
2003
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B. Simmnacher, R. Weiland, J. Höhne, F. v. Feilitzsch, C. Hollerith:
Semiconductor material analysis based on microcalorimeter EDS. Microelectron. Reliab. 43(9-11): 1675-1680 (2003)

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