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Harry A. Schafft

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Journal Articles

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2009
[j4]
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A. Emre Yarimbiyik, Harry A. Schafft, Richard A. Allen, Mark D. Vaudin, Mona E. Zaghloul:
Experimental and simulation studies of resistivity in nanoscale copper films. Microelectron. Reliab. 49(2): 127-134 (2009)
2006
[j3]
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A. Emre Yarimbiyik, Harry A. Schafft, Richard A. Allen, Mona E. Zaghloul, David L. Blackburn:
Modeling and simulation of resistivity of nanometer scale copper. Microelectron. Reliab. 46(7): 1050-1057 (2006)
2003
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Harry A. Schafft, Linda M. Head, Jason Gill, Timothy D. Sullivan:
Early reliability assessment by using deep censoring. Microelectron. Reliab. 43(1): 1-16 (2003)
2001
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Constance E. Schuster, Mark G. Vangel, Harry A. Schafft:
Improved estimation of the resistivity of pure copper and electrical determination of thin copper film dimensions. Microelectron. Reliab. 41(2): 239-252 (2001)

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