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Aswin Sreedhar
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2010 – 2019
- 2012
- [j2]Aswin Sreedhar, Sandip Kundu, Israel Koren:
On Reliability Trojan Injection and Detection. J. Low Power Electron. 8(5): 674-683 (2012) - 2011
- [c12]Aswin Sreedhar, Sandip Kundu:
On design of test structures for lithographic process corner identification. DATE 2011: 800-805 - [c11]Sandip Kundu, Aswin Sreedhar:
Modeling manufacturing process variation for design and test. DATE 2011: 1147-1152 - [c10]Aswin Sreedhar, Sandip Kundu:
Physically unclonable functions for embeded security based on lithographic variation. DATE 2011: 1632-1637 - [c9]Aswin Sreedhar, Sandip Kundu:
On discovery of "missing" physical design rules via diagnosis of soft-faults. ISQED 2011: 251-256 - 2010
- [c8]Shruti Vyas, Aswin Sreedhar, Sandip Kundu:
TURBONFS: turbo nand flash search. ACM Great Lakes Symposium on VLSI 2010: 251-256
2000 – 2009
- 2009
- [c7]Aswin Sreedhar, Sandip Kundu:
On linewidth-based yield analysis for nanometer lithography. DATE 2009: 381-386 - [c6]Aswin Sreedhar, Sandip Kundu:
Statistical timing analysis based on simulation of lithographic process. ICCD 2009: 29-34 - [c5]Rance Rodrigues, Aswin Sreedhar, Sandip Kundu:
Optical lithography simulation using wavelet transform. ICCD 2009: 427-432 - 2008
- [j1]Aswin Sreedhar, Sandip Kundu:
Lithography Simulation Basics and a Study on Impact of Lithographic Process Window on Gate and Path Delays. J. Low Power Electron. 4(3): 392-401 (2008) - [c4]Aswin Sreedhar, Alodeep Sanyal, Sandip Kundu:
On Modeling and Testing of Lithography Related Open Faults in Nano-CMOS Circuits. DATE 2008: 616-621 - [c3]Aswin Sreedhar, Sandip Kundu:
Modeling and analysis of non-rectangular transistors caused by lithographic distortions. ICCD 2008: 444-449 - [c2]Aswin Sreedhar, Sandip Kundu:
Statistical Yield Modeling for Sub-wavelength Lithography. ITC 2008: 1-8 - 2007
- [c1]Aswin Sreedhar, Sandip Kundu:
On modeling impact of sub-wavelength lithography on transistors. ICCD 2007: 84-90
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