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Jamie K. Schaeffer

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2010 – 2019

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2013
[c2]
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Dina H. Triyoso, Klaus Hempel, Susanne Ohsiek, Jeff Shu, Jamie K. Schaeffer, Markus Lenski:
Impact of precursors choice on characteristics of PEALD SiN for spacer applications. ICICDT 2013: 69-72
2012
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D. H. Triyoso, V. Jaschke, Jeff Shu, S. Mutas, Klaus Hempel, Jamie K. Schaeffer, Markus Lenski:
Robust PEALD SiN spacer for gate first high-k metal gate integration. ICICDT 2012: 1-4

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