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ORCIDPeter Baumgartner 0005
Person information
- affiliation: Intel, Neubiberg, Germany
- affiliation: Infineon Technologies AG, Neubiberg, Germany
Other persons with the same name
- Peter Baumgartner 0001
![[0000-0002-6559-9654]](https://dblp.uni-trier.de./img/orcid-mark.12x12.png "0000-0002-6559-9654")
— Data61, CSIRO (and 4 more) - Peter Baumgartner 0002 — Donau-Universität Krems, Austria
- Peter Baumgartner 0003 — University of New Brunswick Fredericton, Canada
- Peter Baumgartner 0004 — RTI International, Research Triangle Park, NC, USA
- Peter Baumgartner 0006 — TU Munich, Germany
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2020 – today
- 2024
[c4]Lukas Schramm, Peter Baumgartner, Jasmin Aghassi-Hagmann:
Quantization-Robust On-Chip Jitter Measurement Technique for Multiple Local Oscillator Systems. ISCAS 2024: 1-5- 2023
- [j4]Lukas Schramm, Peter Baumgartner, Jasmin Aghassi-Hagmann:
On-Chip Quantization- and Correlation-Robust Jitter Measurement for Low Phase Noise and High Frequency Oscillators. IEEE Trans. Circuits Syst. II Express Briefs 70(11): 3958-3962 (2023) - [c3]Lukas Schramm, Peter Baumgartner, Jasmin Aghassi-Hagmann:
Influence of Transistor Compact Model Accuracy on Phase Noise Simulation. PRIME 2023: 329-332 - 2022
- [j3]Richard Hudeczek, Ehrentraud Hager, Peter Baumgartner, Harald Pretl:
Performance Analysis of Resonant-Fin Transistors and Their Application in RF-Circuit Design. IEEE Access 10: 64388-64407 (2022) - 2021
- [c2]Richard Hudeczek, Peter Baumgartner:
Mechanical Band Gap Formation in Anisotropic CMOS Back-End-of-Line Stacks for Monolithic High-Q MEMS Resonator Confinement. ESSDERC 2021: 211-214
2000 – 2009
- 2009
- [j2]Domagoj Siprak, Marc Tiebout, Nicola Zanolla, Peter Baumgartner, Claudio Fiegna:
Noise Reduction in CMOS Circuits Through Switched Gate and Forward Substrate Bias. IEEE J. Solid State Circuits 44(7): 1959-1967 (2009) - 2008
- [c1]Domagoj Siprak, Marc Tiebout, Peter Baumgartner:
Reduction of VCO phase noise through forward substrate biasing of switched MOSFETs. ESSCIRC 2008: 326-329 - 2001
- [j1]Bakuri Lanchava, Peter Baumgartner, Andreas Martin, Armand Beyer, Erich Mueller:
Oxide reliability: influence of interface roughness, structure layout, and depletion layer formation. Microelectron. Reliab. 41(7): 1097-1100 (2001)
Coauthor Index
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