"Oxide reliability: influence of interface roughness, structure layout, and ..."

Bakuri Lanchava et al. (2001)

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DOI: 10.1016/S0026-2714(01)00069-5

access: closed

type: Journal Article

metadata version: 2021-05-26

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Bakuri Lanchava, Peter Baumgartner, Andreas Martin, Armand Beyer, Erich Mueller:
Oxide reliability: influence of interface roughness, structure layout, and depletion layer formation. Microelectron. Reliab. 41(7): 1097-1100 (2001)

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