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2010 – 2019
- 2011
[j9]Mauro Ciappa, Luigi Mangiacapra, Maria Stangoni, Stephan Ott, Wolfgang Fichtner:
Design of optimum electron beam irradiation processes for the reliability of electric cables used in critical applications. Microelectron. Reliab. 51(9-11): 1479-1483 (2011)
2000 – 2009
- 2009
- [j8]Mauro Ciappa, Luigi Mangiacapra, Maria Stangoni, Stephan Ott, Wolfgang Fichtner:
Ensuring the reliability of electron beam crosslinked electric cables by the optimization of the dose depth distribution with Monte Carlo simulation. Microelectron. Reliab. 49(9-11): 972-976 (2009) - 2005
- [j7]Marco Buzzo, Mauro Ciappa, Maria Stangoni, Wolfgang Fichtner:
Two-dimensional Dopant Profiling and Imaging of 4H Silicon Carbide Devices by Secondary Electron Potential Contrast. Microelectron. Reliab. 45(9-11): 1499-1504 (2005) - [j6]Maria Stangoni, Mauro Ciappa, Wolfgang Fichtner:
Assessment of the Analytical Capabilities of Scanning Capacitance and Scanning Spreading Resistance Microscopy Applied to Semiconductor Devices. Microelectron. Reliab. 45(9-11): 1532-1537 (2005) - 2004
- [j5]Marco Buzzo, Markus Leicht, Thomas Schweinböck, Mauro Ciappa, Maria Stangoni, Wolfgang Fichtner:
2D Dopant Profiling on 4H Silicon Carbide P+N Junction by Scanning Capacitance and Scanning Electron Microscopy. Microelectron. Reliab. 44(9-11): 1681-1686 (2004) - [j4]Mauro Ciappa, Maria Stangoni, Wolfgang Fichtner, Elisa Ricci
, Andrea Scorzoni:
On the Use of Neural Networks to Solve the Reverse Modelling Problem for the Quantification of Dopant Profiles Extracted by Scanning Probe Microscopy Techniques. Microelectron. Reliab. 44(9-11): 1703-1708 (2004) - 2003
- [j3]Maria Stangoni, Mauro Ciappa, Wolfgang Fichtner:
A New Procedure to Define the Zero-Field Condition and to Delineate pn-Junctions in Silicon Devices by Scanning Capacitance Microscopy. Microelectron. Reliab. 43(9-11): 1651-1656 (2003) - [j2]Giovanna Mura, Massimo Vanzi, Maria Stangoni, Mauro Ciappa, Wolfgang Fichtner:
On the behaviour of the selective iodine-based gold etch for the failure analysis of aged optoelectronic devices. Microelectron. Reliab. 43(9-11): 1771-1776 (2003) - 2002
- [j1]Maria Stangoni, Mauro Ciappa, Marco Buzzo, Markus Leicht, Wolfgang Fichtner:
Simulation and Experimental Validation of Scanning Capacitance Microscopy Measurements across Low-doped Epitaxial PN-Junction. Microelectron. Reliab. 42(9-11): 1701-1706 (2002)
Coauthor Index
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