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Sethavut Duangchan

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2010 – 2019

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2019
[c2]
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Sethavut Duangchan, Keisuke Yamamoto, Dong Wang, Hiroshi Nakashima, Akiyoshi Baba:
SiN used as a Stressor in Germanium-On-Insulator Substrate. 3DIC 2019: 1-5
2015
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Ryouya Shirahama, Sethavut Duangchan, Yusuke Koishikawa, Akiyoshi Baba:
Influential factors in low-temperature direct bonding of silicon dioxide. 3DIC 2015: TS8.16.1-TS8.16.5

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