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Moitreyee Mukherjee-Roy

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Journal Articles

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2004
[j4]
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Sohan Singh Mehta, Sun Hai Qin, Moitreyee Mukherjee-Roy, Navab Singh, Rakesh Kumar:
Resist pattern peeling assessment in DUV chemically amplified resist. Microelectron. J. 35(5): 427-429 (2004)
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Sohan Singh Mehta, Navab Singh, Moitreyee Mukherjee-Roy, Rakesh Kumar:
Placement of scattering bars in binary and attenuated phase shift mask for damascene trench patterning. Microelectron. J. 35(7): 621-626 (2004)
2003
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Navab Singh, Moitreyee Mukherjee-Roy, Sohan Singh Mehta:
Defocusing image to pattern contact holes using attenuated phase shift masks. Microelectron. J. 34(4): 237-245 (2003)
[j1]
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Moitreyee Mukherjee-Roy, Navab Singh, Sohan Singh Mehta, G. S. Samudra:
A new approach for eliminating unwanted patterns in attenuated phase shift masks. Microelectron. J. 34(10): 965-967 (2003)

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