"Resist pattern peeling assessment in DUV chemically amplified resist."

Sohan Singh Mehta et al. (2004)

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DOI: 10.1016/J.MEJO.2004.01.003

access: closed

type: Journal Article

metadata version: 2020-02-22

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Sohan Singh Mehta, Sun Hai Qin, Moitreyee Mukherjee-Roy, Navab Singh, Rakesh Kumar:
Resist pattern peeling assessment in DUV chemically amplified resist. Microelectron. J. 35(5): 427-429 (2004)

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