"In Situ Monitoring of Photoresist Thickness Uniformity of a Rotating Wafer ..."

Arthur Tay et al. (2009)

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DOI: 10.1109/TIM.2009.2021620

access: closed

type: Journal Article

metadata version: 2022-01-03

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Arthur Tay, Weng Khuen Ho, Xiaodong Wu, Xiaoqi Chen:
In Situ Monitoring of Photoresist Thickness Uniformity of a Rotating Wafer in Lithography. IEEE Trans. Instrum. Meas. 58(12): 3978-3984 (2009)

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