"The need for multi-scale approaches in Cu/low-k reliability issues."

Cadmus A. Yuan et al. (2008)

> Home

Details and statistics

DOI: 10.1016/J.MICROREL.2008.03.024

access: closed

type: Journal Article

metadata version: 2025-03-03

- view
  - electronic edition via DOI
  - unpaywalled version
  authority control:
- export record
  dblp key:
  - journals/mr/YuanSDZ08
- ask others
- share record
  persistent URL:
  - https://dblp.org/rec/journals/mr/YuanSDZ08
Cadmus A. Yuan, Olaf van der Sluis, Willem D. van Driel, G. Q. (Kouchi) Zhang:
The need for multi-scale approaches in Cu/low-k reliability issues. Microelectron. Reliab. 48(6): 833-842 (2008)

manage site settings

To protect your privacy, all features that rely on external API calls from your browser are turned off by default. You need to opt-in for them to become active. All settings here will be stored as cookies with your web browser. For more information see our F.A.Q.