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"Delamination analysis of Cu/low-k technology subjected to ..."
Cadmus A. Yuan et al. (2006)
- Cadmus A. Yuan, Willem D. van Driel, Richard B. R. van Silfhout, Olaf van der Sluis
, Roy A. B. Engelen, Leo J. Ernst, Fred van Keulen
, G. Q. Zhang:
Delamination analysis of Cu/low-k technology subjected to chemical-mechanical polishing process conditions. Microelectron. Reliab. 46(9-11): 1679-1684 (2006)
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