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"Effect of nitridation on the reliability of thick gate oxides."

C.-T. Wu et al. (2003)

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DOI: 10.1016/S0026-2714(02)00122-1

access: closed

type: Journal Article

metadata version: 2020-05-07

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  - journals/mr/WuMRDGLR03
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  - https://dblp.org/rec/journals/mr/WuMRDGLR03
C.-T. Wu, A. Mieckowski, R. S. Ridley, G. Dolny, T. Grebs, J. Linn, Jerzy Ruzyllo:
Effect of nitridation on the reliability of thick gate oxides. Microelectron. Reliab. 43(1): 43-47 (2003)

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