"Determination of migration effects in Cu-via structures with respect to ..."

Kirsten Weide-Zaage et al. (2008)

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DOI: 10.1016/J.MICROREL.2008.06.028

access: closed

type: Journal Article

metadata version: 2020-02-22

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Kirsten Weide-Zaage, Jiani Zhao, Joharsyah Ciptokusumo, Oliver Aubel:
Determination of migration effects in Cu-via structures with respect to process-induced stress. Microelectron. Reliab. 48(8-9): 1393-1397 (2008)

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