"Gate stress effect on low temperature data retention characteristics of ..."

Ling-Chang Hu et al. (2005)

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DOI: 10.1016/J.MICROREL.2005.07.016

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type: Journal Article

metadata version: 2020-02-22

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Ling-Chang Hu, An-Chi Kang, Eric Chen, J. R. Shih, Yao-Feng Lin, Kenneth Wu, Ya-Chin King:
Gate stress effect on low temperature data retention characteristics of split-gate flash memories. Microelectron. Reliab. 45(9-11): 1331-1336 (2005)

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