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J. R. Shih

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2010 – 2019

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2015
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  - conf/irps/ChenCLLLHTLS15
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I. K. Chen, C. L. Chen, Y.-H. Lee, R. Lu, Y. W. Lee, H. H. Hsu, Y. W. Tseng, Y. W. Lin, J. R. Shih:
New TDDB lifetime model for AC inverter-like stress in advance FinFET structure. IRPS 2015: 5

2000 – 2009

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2005
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Ling-Chang Hu, An-Chi Kang, Eric Chen, J. R. Shih, Yao-Feng Lin, Kenneth Wu, Ya-Chin King:
Gate stress effect on low temperature data retention characteristics of split-gate flash memories. Microelectron. Reliab. 45(9-11): 1331-1336 (2005)

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