"Impact of the As dose in 0.35 mum EEPROM technology: characterization and ..."

N. Galbiati et al. (2001)

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DOI: 10.1016/S0026-2714(01)00056-7

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type: Journal Article

metadata version: 2020-02-22

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N. Galbiati, G. Ghidini, C. Cremonesi, Luca Larcher:
Impact of the As dose in 0.35 mum EEPROM technology: characterization and modeling. Microelectron. Reliab. 41(7): 999-1002 (2001)

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