"Wafer scale and reliability investigation of thin ..."

Abel Fontserè et al. (2012)

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DOI: 10.1016/J.MICROREL.2012.06.131

access: closed

type: Journal Article

metadata version: 2022-02-04

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Abel Fontserè, Amador Pérez-Tomás, Philippe Godignon, José Millán, Herbert De Vleeschouwer, John M. Parsey, Peter Moens:
Wafer scale and reliability investigation of thin HfO₂·AlGaN/GaN MIS-HEMTs. Microelectron. Reliab. 52(9-10): 2220-2223 (2012)

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