"Boron diffusion and activation in polysilicon multilayer films for ..."

Ramdane Mahamdi et al. (2009)

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DOI: 10.1016/J.MEJO.2008.08.003

access: closed

type: Journal Article

metadata version: 2022-10-02

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Ramdane Mahamdi, Laurent Saci, Farida Mansour, Pierre Temple-Boyer, Emmanuel Scheid, Laurent Jalabert:
Boron diffusion and activation in polysilicon multilayer films for P⁺ MOS structure: Characterization and modeling. Microelectron. J. 40(1): 1-4 (2009)

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