"Characterization of Negative Photoresist Processing by Statistical Design ..."

Sei-Young Mun et al. (2005)

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DOI: —

access: open

type: Journal Article

metadata version: 2021-02-16

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Sei-Young Mun, Gwang-Beom Kim, Dea-Wha Soh, Sang Jeen Hong:
Characterization of Negative Photoresist Processing by Statistical Design of Experiment (DOE). J. Inform. and Commun. Convergence Engineering 3(4): 191-194 (2005)

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