"Photomask Data Prioritization Based on VLSI Design Intent and Its ..."

Kokoro Kato et al. (2010)

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DOI: 10.1587/TRANSFUN.E93.A.2424

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type: Journal Article

metadata version: 2020-04-11

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Kokoro Kato, Masakazu Endo, Tadao Inoue, Shigetoshi Nakatake, Masaki Yamabe, Sunao Ishihara:
Photomask Data Prioritization Based on VLSI Design Intent and Its Utilization for Mask Manufacturing. IEICE Trans. Fundam. Electron. Commun. Comput. Sci. 93-A(12): 2424-2432 (2010)

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