"Deep Learning Regression of VLSI Plasma Etch Metrology."

Jack Kenney et al. (2019)

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DOI: —

access: open

type: Informal or Other Publication

metadata version: 2019-10-25

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  - electronic edition @ arxiv.org (open access)
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  dblp key:
  - journals/corr/abs-1910-10067
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  persistent URL:
  - https://dblp.org/rec/journals/corr/abs-1910-10067
Jack Kenney, John Valcore, Scott Riggs, Edward A. Rietman:
Deep Learning Regression of VLSI Plasma Etch Metrology. CoRR abs/1910.10067 (2019)

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