"Fabrication of through silicon via with highly phosphorus-doped ..."

Naokatsu Ikegami et al. (2016)

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DOI: 10.1109/NEMS.2016.7758318

access: closed

type: Conference or Workshop Paper

metadata version: 2023-09-30

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Naokatsu Ikegami, Takashi Yoshida, Akira Kojima, Hiroshi Miyaguchi, Masanori Muroyama, Shinya Yoshida, Kentaro Totsu, Nobuyoshi Koshida, Masayoshi Esashi:
Fabrication of through silicon via with highly phosphorus-doped polycrystalline Si plugs for driving an active-matrix nanocrystalline Si electron emitter array. NEMS 2016: 578-582

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