"Study of doping of Ge0.96Si0.04: H films with B, and P during low ..."

Ismael Cosme et al. (2011)

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DOI: 10.1109/ICEEE.2011.6106619

access: closed

type: Conference or Workshop Paper

metadata version: 2023-10-31

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Ismael Cosme, Andrey Kosarev, Francisco Temoltzi, Adrian Itzmoyotl:
Study of doping of Ge0.96Si0.04: H films with B, and P during low frequency plasma deposition at low temperature. CCE 2011: 1-3

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