"On mask layout partitioning for electron projection lithography."

Ruiqi Tian et al. (2002)

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DOI: 10.1145/774572.774648

access: closed

type: Conference or Workshop Paper

metadata version: 2023-03-24

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Ruiqi Tian, Ronggang Yu, Xiaoping Tang, D. F. Wong:
On mask layout partitioning for electron projection lithography. ICCAD 2002: 514-518

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