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"Analysis of yield loss due to random photolithographic defects in the ..."

Nicola Campregher et al. (2005)

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DOI: 10.1145/1046192.1046211

access: closed

type: Conference or Workshop Paper

metadata version: 2018-11-06

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  - conf/fpga/CampregherCCV05
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Nicola Campregher, Peter Y. K. Cheung, George A. Constantinides, Milan Vasilko:
Analysis of yield loss due to random photolithographic defects in the interconnect structure of FPGAs. FPGA 2005: 138-148

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