"Generic lithography modeling with dual-band optics-inspired neural networks."

Haoyu Yang et al. (2022)

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DOI: 10.1145/3489517.3530580

access: closed

type: Conference or Workshop Paper

metadata version: 2024-08-04

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Haoyu Yang, Zongyi Li, Kumara Sastry, Saumyadip Mukhopadhyay, Mark Kilgard, Anima Anandkumar, Brucek Khailany, Vivek Singh, Haoxing Ren:
Generic lithography modeling with dual-band optics-inspired neural networks. DAC 2022: 973-978

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