"Complexity reduction of a thin film deposition model using a trajectory ..."

Philipp Wolfrum et al. (2005)

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DOI: 10.1109/ACC.2005.1470353

access: closed

type: Conference or Workshop Paper

metadata version: 2023-09-30

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Philipp Wolfrum, Alejandro Vargas, Martha A. Gallivan, Frank Allgöwer:
Complexity reduction of a thin film deposition model using a trajectory based nonlinear model reduction technique. ACC 2005: 2566-2571

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