"3D thermal modeling of a plasma assisted chemical vapor deposition process."

Sébastien Rouquette et al. (2002)

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DOI: 10.1109/ACC.2002.1024522

access: closed

type: Conference or Workshop Paper

metadata version: 2024-08-03

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Sébastien Rouquette, Laurent Autrique, Charles Chaussavoine, Laurent Thomas:
3D thermal modeling of a plasma assisted chemical vapor deposition process. ACC 2002: 3813-3816

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