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V. N. Bliznetsov

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2005
[j2]
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H. Y. Li, Y. J. Su, C. F. Tsang, S. M. Sohan, V. N. Bliznetsov, L. Zhang:
Process improvement of 0.13mum Cu/Low K (Black Diamond^TM) dual damascene interconnection. Microelectron. Reliab. 45(7-8): 1134-1143 (2005)
2003
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C. F. Tsang, V. N. Bliznetsov, Y. J. Su:
Study and improvement of electrical performance of 130 nm Cu/CVD low k SiOCH interconnect related to via etch process. Microelectron. J. 34(11): 1051-1058 (2003)

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