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Hans C. Pfeiffer

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2000 – 2009

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2001
[j2]
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  - journals/ibmrd/DhaliwalEGGKLPPRRST01
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  - https://dblp.org/rec/journals/ibmrd/DhaliwalEGGKLPPRRST01
Rajinder S. Dhaliwal, William A. Enichen, Steven D. Golladay, Michael S. Gordon, Rodney A. Kendall, Jon E. Lieberman, Hans C. Pfeiffer, David J. Pinckney, Christopher F. Robinson, James D. Rockrohr, Werner Stickel, Eileen V. Tressler:
PREVAIL-Electron projection technology approach for next-generation lithography. IBM J. Res. Dev. 45(5): 615-638 (2001)

1990 – 1999

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1993
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Timothy R. Groves, John G. Hartley, Hans C. Pfeiffer, Denise Puisto, Donald K. Bailey:
Electron beam lithography tool for manufacture of X-ray masks. IBM J. Res. Dev. 37(3): 411-420 (1993)

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